主持人:董建文 教授
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摘要:
The advancement of integrated circuits (ICs)(7nm node technology in 2019)stimulates the development of failure analysis (FA) techniques. As a non-destructive technique, advanced far field optical microscopy using aplanatic solid immersion lens (ASIL) provides higher spatial resolution, improved light collection efficiency and the capability of subsurface imaging. Although this technique has been experimentally employed to image ICs, the resolution cannot satisfy the increasing requirements of FA. In order to obtain better resolution, a complete and computationally efficient model of ASIL microscope is presented, which considers all of the components that influence resolution and therefore provides the opportunity to precisely vary individual parameters and then to explicitly evaluate the performance of a microscope. This technique has been applied in the industrial solid immersion microscopy for failure analysis of integrated circuits, which is beneficial to maintain the quality and reliability of ICs in FA.
报告人简介:
陈瑞,于2013年在新加坡国立大学获得博士学位,随后一直以研究员的身份在新加坡国立大学从事研究工作。2018年7月以百人计划副教授加入中山大学物理学院。目前主要的研究方向包括远场超分辨成像、超表面超材料的优化设计,计算成像以及逆散射成像